Efficient Generation of Extreme Ultraviolet Light From Nd :YAG-Driven Microdroplet-Tin Plasma
نویسندگان
چکیده
منابع مشابه
Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching
Tin Sn has the advantage of delivering higher conversion efficiency compared to other fuel materials e.g., Xe or Li in an extreme ultraviolet EUV source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in a lithography system leads to some additional challenges for maintaining a satisfactory lifetime of the collector optics. A critical i...
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Ultrashort extreme-ultraviolet pulses are a key tool in timeresolved spectroscopy for the investigation of electronic motion in atoms1,2, molecules3 and solids4. High-harmonic generation is a well-established process for producing ultrashort extreme-ultraviolet pulses by direct frequency upconversion of femtosecond near-infrared pulses5–7. However, elaborate pump–probe experiments performed on ...
متن کاملGeneration of spatially coherent light at extreme ultraviolet wavelengths.
We present spatial coherence measurements of extreme ultraviolet (EUV) light generated through the process of high-harmonic up-conversion of a femtosecond laser. With a phase-matched hollow-fiber geometry, the generated beam was found to exhibit essentially full spatial coherence. The coherence of this laser-like EUV source was shown by recording Gabor holograms of small objects. This work demo...
متن کاملComparative study on EUV and debris emission from CO2 and Nd: YAG laser-produced tin plasmas
The emission characteristics of debris from laser-produced tin plasma were investigated for an extreme ultraviolet lithography (EUV) light source. The ions and droplets emitted from tin plasma produced by a CO2 laser or an Nd: YAG laser were detected with Faraday cups and quartz crystal micro-balance (QCM) detectors, respectively. A higher ion kinetic energy and a lower droplet emission were ob...
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The interaction of a CO2 laser pulse with Sn-based plasma for a 13.5-nm extreme ultraviolet (EUV) lithography source was investigated. It was noted that a CO2 laser with wavelength of 10.6 μm is more sensitive to surface impurities as compared with a Nd:YAG laser with wavelength of 1.06 μm. This reveals that a CO2 laser is more likely absorbed in a thinner layer near the target surface. Compare...
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ژورنال
عنوان ژورنال: Physical Review Applied
سال: 2019
ISSN: 2331-7019
DOI: 10.1103/physrevapplied.12.014010